Performance of MLGNR, SWCNT and Copper as Interconnects for Nanometer Technologies
Karmjit Singh Sandha1, Himanshu Sharma2

1Karmjit Singh Sandha, Department of ECE, Thapar Institute of Engineering and Technology (TIET), Patiala (Panjab), India. email:
2Himanshu Sharma, Department of ECE, Thapar Institute of Engineering and Technology (TIET), Patiala (Panjab), India.

Manuscript received on 18 June 2019 | Revised Manuscript received on 25 June 2019 | Manuscript published on 30 June 2019 | PP: 2272-2276 | Volume-8 Issue-5, June 2019 | Retrieval Number: E7704068519/19©BEIESP
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Abstract: Performance of multilayer graphene nanoribbon (MLGNR), single wall carbon nanotube (SWCNT), and copper as interconnects for different lengths at nanometer technologies (32nm, 22nm, and 16nm) for signal latency and product of power and delay(PDP) is presented. Impedance parameters of MLGNR are discussed by deducing its equivalent single conductor (ESC) model. It is discussed that resistance of MLGNR offers less compared to SWCNT and copper. The performance of MLGNR, SWCNT and copper is estimated with Tanner tool and a comparative investigation is done for the estimated performance of all the materials for signal delay and PDP for three different technologies. It is analyzed from outcomes that delay and PDP of all the three interconnects increases with increase in interconnect length from 500‒2000μm for all the technologies. Further, it is also observed that delay and PDP of MLGNR is lesser in comparison to SWCNT and copper for each technology (32nm, 22nm, and 16nm).
Keywords: Delay, Interconnect, Mlgnr, Nanometer Technologies, Pdp.

Scope of the Article: Nanometer-Scale Integrated Circuits