Impact of Process Variations on Delay in Carbon Nanotube Based Bus Interconnects At Different Technology Nodes
Ch. Praveen Kumar1, E. Sreenivasa Rao2, P. Chandrasekhar3

1Ch. Praveen kumar, ECE department, Research scholar in OSMANIA University and Assistant professor in GITAM University, Hyderabad, Telangana, India.
2E. Srinivasa Rao, ECE department, Vasavi College of Engineering, Hyderabad, Telangana, India.
3P. Chandrasekhar, ECE department, OSMANIA University, Hyderabad, Telangana, India.
Manuscript received on September 23, 2019. | Revised Manuscript received on October 15, 2019. | Manuscript published on October 30, 2019. | PP: 5506-5512 | Volume-9 Issue-1, October 2019 | Retrieval Number: A2034109119/2019©BEIESP | DOI: 10.35940/ijeat.A2034.109119
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Abstract: This paper presents the impact of process variations in carbon nanotube based advanced bus interconnects such as single walled carbon nanotube (SWCNT), multi walled carbon nanotube (MWCNT) and mixed carbon nanotube bundle (MCB). The impact of temperature variations on paracitics of interconnects for variable interconnects at different technology nodes is analyzed. From the analysis, it reveal that the mixed bundle carbon nanotube offering the lower paracitics even higher temperatures compared to SWCNT and MWCNT which leads to lower delay and crosstalk effect when it is used in bus interconnects. Further we have also done delay analysis by changing the bundle area, number of shells and metallic ratio of three interconnect structures with the insertion of obtained parasitics using empirical formulas. It is proven that the mixed CNT (MCB) interconnect structures offered a lesser delay compared to other CNT interconnect structures. All the analysis has been done using MATLAB at 22nm and 32nm technology nodes.
Keywords: Single walled carbon nanotube (SWCNT), multi walled carbon nanotube (MWCNT) and mixed carbon nanotube bundle (MCB), temperature dependent, parasitics, interconnects.